As system designers continue to push for higher voltages, greater power density, faster switching speeds, and increased operating frequencies, even today’s leading WBG materials are beginning to encounter performance limitations. This is driving growing interest in ultra-wide bandgap (UWBG) semiconductor platforms, particularly those based on aluminum nitride (AlN), which offers a unique combination of high...Read More
As RF power densities continue to increase, thermal management has become one of the most critical challenges facing next-generation GaN-based devices. Excessive channel temperatures can reduce efficiency, accelerate degradation mechanisms, and ultimately limit device lifetime. While GaN-on-SiC has long been the industry standard for high-power RF applications, emerging GaN-on-AlN architectures offer a compelling path toward...Read More
The rapid growth of artificial intelligence is driving an unprecedented increase in data center power consumption. Industry forecasts project that data centers could consume over 1,200 TWh of electricity annually by 2030, fueled largely by the deployment of large-scale AI training and inference infrastructure. To support these growing computational demands, data center architectures are undergoing...Read More
This application note outlines recommended ex situ and in situ cleaning procedures for two-inch single crystal aluminum nitride (AlN) substrates. These recommendations are intended to help maintain substrate cleanliness and surface quality when incoming inspection, characterization, or other handling activities occur prior to epitaxial processing. CIS_AN102_Cleaning-InstructionsDownloadRead More
This application note provides handling recommendations for aluminum nitride (AlN) substrates intended for subsequent epitaxial growth. Proper handling is essential to preserve the atomically smooth substrate surface and minimize the risk of contamination or damage that could adversely affect epitaxial layer quality. These recommendations are specifically intended for epi-ready, CMP-polished AlN substrates provided by Crystal...Read More
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