Optoelectronics

Applications

Water Treatment

Aluminum nitride (AlN) supports high‑performance UV optoelectronic devices that enable efficient, reliable water purification and disinfection systems.

 

  • Enables high‑power germicidal UV emission
  • Improved WPE with better IQE than sapphire
  • Long device lifetimes in harsh environments

 

UV Curing

Bulk AlN substrates enable next generation thermally efficient diodes with emission at ideal wavelengths for Ink and coating processes. Efficiently designed curing systems eliminate the need for mercury and increase throughput and reliability for roll good manufactures.

 

  • Supports high optical power density
  • Improves thermal stability during operation
  • Enables compact, high‑efficiency UV systems

UV Lasers

For advanced UV laser systems, AlN provides the material foundation required for precision, power, and reliability across demanding applications.

  • Enables deep‑UV wavelength performance
  • High thermal conductivity for stability
  • Supports high‑power, high‑precision output

Benefits

  • Low defect density for improved lifetime and reliability
  • High IQE (> 90%) enables high light ouput and improved WPE at UVC wavelengths
  • Front-side surface emission enables high density die arrays for high power applications

Single-Crystal AlN Substrates

Premium aluminum nitride substrates engineered for demanding dual-use applications in optoelectronics, power electronics, and RF systems. Our substrates deliver unmatched thermal performance and electrical isolation.

Key Specifications:

  • Thermal Conductivity: ≥ 300 W/mK
  • Diameter Range: 50.8 mm – 100 mm
  • Surface Roughness: Sub-nm SSP or DSP
  • Shape/Flatness: Industry-accepted metrics
  • Miscut: 0.2 degrees (0-4 degrees custom)

RESOURCES

Documentation

Documentation

AlN Basics

Introduction to aluminum nitride substrates, crystal properties, and foundational material concepts.
 

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Documentation

Technical Papers

Collection of scientific publications and technical papers focused on AlN materials and devices.
 

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PDF

CISM 100mm Substrate Datasheet

Technical specifications and performance characteristics for Crystal IS 100 mm AlN substrates.
 

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Article

New Pilot Production Line for 100 mm Aluminum Nitride (AlN) Substrates at Crystal IS

Overview of Crystal IS manufacturing expansion and pilot production capabilities for large diameter AlN substrates.
 

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Article

Using Aluminum Nitride (AlN) to Access UVC Wavelengths

Discussion of how AlN materials enable deep ultraviolet and UVC optoelectronic device development.
 

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Article

Benefits of AlN in Optoelectronics

Overview of aluminum nitride advantages in advanced optoelectronic and photonic applications.
 

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